基于天然dna自组装图案的尺寸可控微影技术

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1、万方数据浙江理工大学硕士学位论文基于天然DNA自组装图案的尺寸可控徽影技术AnegativereplicaisobtainedbytransferringtheDNApatternstoUPRbasedonsurfaceroughnessanalysis，andapositivecopyistransferredtOPAM．BycontrolleddryingandswellingofthePAMstamp,customsize-scalablefeaturesarcobtained．SEMandAFMima

2、gesrevealthattheachievablerangeofthepatternfeaturesizeis0．25％to200％，andanaverageheightandwidthofsinglelinearstructureonthecontractedPAMstamparc35．2士4．1lnmand363．34-17．66nm．Additionallythispaperalsomadesomeauxiliaryworkassociated谢tllDNA(i．e．，themechanismofDN

3、Adouble-helixstructureintheformationofPHPMAmorphologybasedonmoleculedesign)：AUTEABwassuccessfullysynthesized，andconfirmedbyFTIRand‘H-NMRspectra．TheDNAmoleculesgetintothepolymerizationsystembythecomplexofAUTEABandDNA．ThepomponmorphologyofPHPMAisobtainedthrou

4、ghsolutionradicalpolymerization．Asaresult,themorphologystructureofPHPMAchangesfrompompontopolyhedronbyelutionofhydrochloricacid．SEMimagesshowthataveragediameterofpomponsis0．79lan，andpolyhedronisdecreasedtoO．65ttm，thewidthofchenillestructureisl7．53mn．Thestru

5、ctureofDNAcomplexmodelwasestablishedbasedoncalculationandUVspectra,whichshowsthechenilleonPI-IPMAsurfaceisaspatialstructureofDNAcomplex．Thetheoreticalwidthofchenillestructuresimulatedbythemodeliscloseagreement谢廿lthepractical，demonstratingtheavailabilityofth

6、emodel．Thisfacilestrategyofcustomizinglithographyfeaturesizeprovidesanewavenueforcontrolledanduniformassemblyofpatternedcomponenm诵nlhigllscalabilitytowardtheirintegrationforelectroniccircuitryondesiredsubstrates，andnanolithographytechniquesforachievingpatte

7、rnscalability．Moreover,itishopefultocontributeinthedevelopmentofnanoteclmologyinthefuture．Keywords：micro-fabrication，lithography,DNApatterns，sizecustomizedPAMstamp，DNAdouble-helixstructureIV万方数据浙江理工大学硕士学位论文基于天然DN．A自组装图案的尺寸可控微影技术目录摘要⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯⋯

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